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 Boron nitride thin films. deposited by magnetron sputtering on Si3N4
Наименование:

Boron nitride thin films. deposited by magnetron sputtering on Si3N4

автор Jean L. издательство Книга по Требованию Химическая и лесная промышленность
Cтраниц 96        мягкая обложка       
Аннотация:In this work we present the results of the thin films of boron nitride deposited by D. C. and R. F. magnetron sputtering from hot-pressed B4C and h-BN targets on two different substrates: The influence of parameters such as substrate temperature and working gas composition ratio (N2 or Ar), on film thickness, deposition rate, cristallinity, residual stress, phase composition and hardness, were systematically investigated using techniques like SEM, XRD, FT-IR and nanohardness. Si3N4 ceramics with different surface finishing and Si(100) wafers.
Автор: Jean L.
Издательство: Книга по Требованию
Год:2010
Цена:
2007 руб
Нет в наличии
Поиск: Boron nitride thin films. deposited by magnetron sputtering on Si3N4
НОВЫЙ ГОД СИМВОЛ 2013 ГОДАУКРАШЕНИЯ
КАРНАВАЛ НА НОВЫЙ ГОД РАСПРОДАЖА
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