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 Electrical and Mechanical Properties of Mesoporous Silica Thin Films. Effects of pore functionalization
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Electrical and Mechanical Properties of Mesoporous Silica Thin Films. Effects of pore functionalization

автор Amit P. издательство Книга по Требованию Книги
Cтраниц 140        мягкая обложка       
Аннотация:However these films are susceptible to instabilities in electrical behavior due to water uptake and copper diffusion. In summary, this work shows ways to tailor electrical and mechanical properties of MPS low-? dielectrics for future applications. In this work we used MPS films with 3D-Cubic pores for most of the studies. Mesoporous silica (MPS) thin films are attractive for application as low-? interlayer dielectric (ILD) in integrated circuits. This work discusses the electrical, chemical, and thermal instabilities, Cu diffusion, and adhesion of these materials for evaluating and enabling their use for applications as future ILD in device wiring. Pore structure is another key parameter in defining mechanical and electrical performance of MPS films. Thermal stability of functional groups and adhesion of these films with Cu are also key questions for integration of these dielectrics into real devices. We do try to address these questions here for few type of functional MPS films. Differences in properties of MPS films with pores oriented parallel to substrate (2D-hexagonal) and MPS films with cubic fashion (3D-cubic) pores are discussed towards the end.
Автор: Amit P.
Издательство: Книга по Требованию
Год:2011
Цена:
2279 руб
Нет в наличии
Поиск: Electrical and Mechanical Properties of Mesoporous Silica Thin Films. Effects of pore functionalization
НОВЫЙ ГОД СИМВОЛ 2013 ГОДАУКРАШЕНИЯ
КАРНАВАЛ НА НОВЫЙ ГОД РАСПРОДАЖА
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